Fluoride Process Measurement Guide – The efficient use of Fluoride is an important part of the semiconductor industry’s fabrication process. Effective etching of semiconductor wafers is dependent on the use of Hydrofluoric acid. These processes produce wastewater and effluent contaminated with Fluoride, which must be accurately analyzed for effective treatment.
ECD’s Fluoride Monitoring System provides a highly accurate turn-key analyzer solution with an advanced controller and precision pION sensors for semiconductor fabrication washing and wastewater treatment processes. The T80 Transmitter provides multi-channel comparison of measurements or inputs, which can improve the accuracy of Fluoride measurement.
For example, Fluoride ions are affected by changes in the pH of a solution. The correct measurement of Fluoride levels is only possible if pH is also calculated and appropriate compensation algorithms are processed. The flexible and powerful T80 easily handles these types of measurement comparisons for accurate Fluoride measurement.
ECD’s S80 specific ion (pION) fluoride electrode cartridge measures the activity of “free” fluoride ions in solution in concentrations from 0.02 to 2,000 ppm over a pH range from 5 – 8 pH. They operate over a wide temperature range of 0 to 80º C.
ECD manufactures a complete line of Fluoride electrodes, Fluoride sensors, Fluoride meters, Fluoride controllers, Fluoride analyzers and Fluoride meters.